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S3000S System

The S3000S™ Metrology System is designed for in-line process control of advanced diffusion and fabwide thin film applications. Its innovative optical design enables simultaneous measurement with multi-wavelength, multi-angle Focus Beam Ellipsometry (FBE) and deep ultraviolet reflectometry (DUVR), reducing measurement time and significantly increasing throughput over previous generations.

 

For more information on the S3000S System, please contact us.

Overview

  • Combines higher throughput with industry-leading stability
  • Designed for thinner films and tighter process tolerances at 45nm and 32nm nodes
  • Simultaneous measurement with FBE and DUVR
  • Repeatable characterization of complex films
  • Incorporates high-intensity, long-life laser light sources for superior stability
  • Small beam size enables measurements in small test sites
  • Laser light sources meet tight tool-to-tool matching requirements in a robust manner
  • Optional MACControl module for one-step, uniform, non-destructive removal of thin film contamination layer